IDEA #2TV0TN High-performance Source Of Multiply Charged Metal Ions

Areas of Application The device is to be used for ion implantation of materials with single/double-charged metal ions (Be, Fe, Cr, Ni, Zr, Mo, W, etc.) and simulation studies of ion irradiation effects on construction materials of nuclear and thermonuclear industry Specifi cation Ions Ion current, μA Ion energy, keV Ion charge Power consumption, W IPR Protection IPR1, IPR2 Be, Fe, Cr, Ni, Zr, Mo, W 10-200 30 +1, +2 1000 Advantages The metal ion source enables to generate beams of single- and double-charged metal ions based on ion-plasma sputtering. The technique applied for creation of operating environment enables forming an atomic concentration and a high-density plasma of almost all metals (Be, Fe, Cr, Ni, Zr, Mo, W and others) without high-temperature heating of the source Stage of Development. Suggestions for Commercialization IRL3, TRL4 Manufacture of single samples by ourselves or jointly with potential partners