IDEA #62FV2Y Helicon Ion Source

Areas of Application The product is to be used in plasma technology for nano- and micro-analytical analyzers, and mass spectrometers with inductively coupled plasma IPR Protection IPR3 Specifi cation Compact plasma generators with magnetic systems on permanent magnets have been developed. Type of beam ions: Beam brightness, А/m2· rad2· еV Plasma concentration, cm–3 Operating gas pressure, mTorr RF power consumption, W Н+, Не+, Ar+ 300 n ~ 1013 10 <300 Advantages The ion sources consume ten times less power under the same parameters of ion current, as compared with the existing analogs. High plasma density in the source is reached due to the creation of effective RF discharge enhanced by external magnetic fi eld Stage of Development. Suggestions for Commercialization IRL5, TRL4 Single-piece manufacture and maintenance, upon request