IDEA #28W9ZJ Method of varying of the carrier concentration of PbSnSe epitaxial films

Method of varying of the carrier concentration of PbSnSe epitaxial films Stage of Development: • The offered technology has been tested by laboratory investigations, in the frame of STCU- 3641 Project implementation. • Has been received patents of Georgia and Azerbaijan • Two electronic companies in Baku “Industrial Automatics” and “AZON” plant have shown the big interest to the offered way. Photos/Pictures: it means aspect Description: Important part of any semiconductor device is the active element - epitaxial film. For increase of efficiency of the device technologists achieve to reduce operating voltage and increase working temperatures of an active element. In technological language - decrease of carriers concentration and stabilization of Fermi level in epitaxial films. The offered method of regulation of carriers concentration in epitaxial films PbSnSe allows to decrease concentration more than 100 times and to reach working temperatures more than 80 degrees on Calvin. For preparation of such epitaxial films is provided to carry out following operations: On oriented substrate BaF2, by evaporation is settled binary components PbSe and SnSe, doped by chrome and indium. For creation of necessary pressure of vapor the additional source of selenium is used. The special regime of temperature of a substrate, sources of binary components and selenium for the purpose of reception thin and continuous epitaxial films is picked up. Innovative advantages: the source Novelty of the represents doped by chrome and indium alloys temperature PbSnSe and specially picked up regime. differences of lattice parameters of the picked up structure of an alloy and a substrate leads to reception strained epitaxial films. In such films Fermi level are displaced deeply in the band gap zone and stabilized. As a result of mutual compensation of impurity of chrome and indium concentration of carriers decreases more than 100 times. Stabilization of Fermi level allows to increase working temperatures of prepared active element. According to the carried researches the basic advantage of the offered method consists in preparation thin epitaxial layers with low carriers concentration and working temperatures more than 80 degrees on Calvin. Areas of Application: The basic spheres of application are the creation of the high-sensitive infrared-detectors: • for background streams 1017 photon/sec.sm2 (room temperature); for a level of a background 1013 photon/sec.sm2 (for space conditions). and main Insignificant invention is that • Contact details: Professor Vugar Aliyev STCU-3641 Project Sub-Manager Institute of Physics ANAS 33, Cavid ave., Baku, AZ-1143, Azerbaijan Tel.: +99412 418-3963; E-mail: vugar@lan.ab.az Targeted Companies: Plant “INDUSTRIAL AUTOMATICS” 22, Safaraliyev St., Baku, AZ 1010, Azerbaijan Phone: +99412 498-1823; Fax.: +99412 493-6771; E-mail: cavadov_natiq@mail.az AZON Plant at the Ministry of Defensive Industry of Azerbaijan Republic
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