IDEA #1IMKU7 High Productive Filtered Direct Current Cathodic Vacuum-Arc Plasma Source

APPLIED RESEARCH • PLASMAPHYSICS AND TECHNOLOGY HIGH PRODUCTIVE FILTERED DIRECT CURRENT CATHODIC VACUUM(cid:2)(cid:2)ARC PLASMA SOURCE • when upgrading of existent vacuum(cid:2)arc equipment for widening their technological potentiality; • for high quality coatings deposition processes in machine building, fine mechanics, microelectronics, optics, automobile industries, etc. Stage ooff Development Prototype available for testing; patented in USA. DescriptionCathodic vacuum arc plasma source with a magnetic filter, which turns the plasma stream 90о, is described. T(cid:2)shaped plasma duct with a system of intercepting screens and fins provides a significally higher degree of absorption of macroparticles when compared to conventional "toroidal" fil(cid:2) ters (more than an order of magnitude). A small ratio of curva(cid:2) ture radius of the plasma duct to its inner radius, a large diam(cid:2) eter of the plasma guiding channel (200 mm), and an optimal geometry of transporting magnetic fields ensure a high throughput of the filter (cid:2) up to 55 %. Filtered plasma source proposed may be used in new vacuum(cid:2)arc industrial setups for the ion plasma processing of materials including deposi(cid:2) tion of high quality coatings. Innovative aspect and main advantages Efficiency of the main versions of known systems and our results s r e t l i f f o e p y T d e p a h s e e n K l ) a e b a a F ( l ) o 5 4 ( l i a d o r o T ) n i t r a M ( ) y k s v o h k o r o G ( l r a u g n a t c e R e p y t e m o D ) s r e d n a S ( e r u t r e p a e d W i ) s t l u s e r r u o ( Fig.1. T(cid:2)shaped filtered vacuum(cid:2)arc plasma source for dia(cid:2) mond(cid:2)like coating (DLC) deposition. Coating deposition rate is 6 μm/h at the diameter 20 cm. Efficiency Ii/Idx100 ,% 3,0 2,5 2,5 2,5 about 5 The ratio of the total ion flow at the channel exit to the dis(cid:2) charge current (Ii/Id) (cid:2) the system efficiency coefficient (cid:2) is commonly assumed to be the criterion of plasma passage effi(cid:2) ciency through the system as a whole (generator + filter). Areas ooff Application Filtered vacuum(cid:2)arc plasma source described can be used for the following coating deposition: DLC, metals (Ti, Cr, Nb, Mo, Cu, Al, etc.), alloys, nitrides, oxides, carbides, composites, multilayers. Such coatings can be used as: • wear(cid:2)resistant coatings at surfaces of fine mechanic ele(cid:2) ments (hydrodynamic and electrostatic supports of gyro(cid:2) scopes and centrifuges, pistons of fuel pumps, etc.); • decorative coatings; • hard protective coatings on magnetic and optic devices; • transparent conducting oxide films in solar sells; • low(cid:2)e films on architectonic glass; • protective biologically indifferent coatings; • “back(cid:2)end” metal layers in ultra large scale integrated cir(cid:2) cuits; Above mentioned filtered plasma source may be used: • in new vacuum(cid:2)arc industrial equipment for the ion plas(cid:2) ma processing of materials including deposition of high quali(cid:2) ty micro(cid:2) and nanostructural coatings; 42 Fig. 2. Elements of the gas dynamic bearing with DLC coat(cid:2) ings (convex hemispheres) and with TiN coatings (concave hemispheres). Contact details Dr. Volodymyr Strelnytskiy National Science Centre “Kharkov Institute of Physics and Technology” Akademicheskaya, 1, Kharkov 61108, Ukraine. Tel/fax: + 38(cid:2)057(cid:2)3356561 E(cid:2)mail: strelnitskij@kipt.kharkov.ua