ELECTRON BEAM TECHNOLOGY AND EQUIPMENT FOR PRODUCING
CARBON(cid:2)(cid:2)BASED MATERIALS WITH AANN AMORPHOUS,, NANO(cid:2)(cid:2)AND MICRO(cid:2)(cid:2)SIZED STRUCTURE
APPENDIX OOFF INNOVATIVETECHNOLOGIES • RESEARCHOONN NANOSTRUCTURESDescription
Technology is based on the method of electron beam evapora(cid:2)
tion of carbon (graphite) using a liquid pool of tungsten and
subsequent condensation of the vapour flow, which was sug(cid:2)
gested by us and patented in Ukraine and the USA (US Patent
#5296274, cl. B05D 1/00 Movchan B.A. and others. “Method
of producing carbon(cid:2)containing materials by electron beam
vacuum evaporation of graphite and subsequent condensa(cid:2)
tionâ€). Evaporation is performed as follows: a plano(cid:2)cylindrical
tungsten tablet 5 – 10 mm high is placed on the end face of a
cylindrical graphite block of 50 – 100 mm diameter and spec(cid:2)
ified length. The tablet is melted by the electron beam and
forms a “hot poolâ€. A continuous transport process of carbon
dissolution in the liquid pool volume, subsequent evaporation
from the pool surface and formation of an intensive vapour
flow of carbon atoms (clusters) is established. Tungsten prac(cid:2)
tically does not evaporate.
Located near the above(cid:2)mentioned carbon evaporation
source is the second independent traditional source of elec(cid:2)
tron beam evaporation of metallic and non(cid:2)metallic materials,
which are added to the main vapour flow of carbon by evapo(cid:2)
ration, if required (The third evaporation source can also be
used).
This method has been recently improved by applying the tech(cid:2)
nique of reflection of the vapour flow of carbon (or carbon plus
additives) from surfaces (mirrors) heated up to high tempera(cid:2)
tures (1000 – 1800°C), to form in space vapour flows of a
specified orientation and more uniform in terms of composi(cid:2)
tion, structure and energy of the particles. This improvement is
required at subsequent deposition of the vapor flow and “engi(cid:2)
neering†of the specified coating structure.
Vapour flow ionization and bleeding gases into the vacuum
chamber can be used as additional technological parameters
for controlling the deposition process and condensate struc(cid:2)
ture.
Temperature of the deposition surface is one of the main tech(cid:2)
nological parameters, controlling the condensate structure.
vapour flow in the range from room temperature to 1000(cid:2)
1200°C and respective structures
3. from amorphous to nano(cid:2) and micro(cid:2)sized.
Possibility of producing macromolecular (fullerenes, nan(cid:2)
otubes) and diamondlike structures, carbides and composite
materials (coatings) on their base is shown.
A pilot production electron beam unit of up to 250 kW power
adapted to the above technology variants is available. Areas ooff Application::
Electronics and optoelectronics, medicine, chemical technolo(cid:2)
gy, instrument and mechanical engineering.
a)
b)
Pic.1 Examples of special structures of carbon con(cid:2)
densates: nanotubes (a) and spheres (b).
Rate of evaporation of a graphite block of 70 mm diameter is
equal to 1.0 – 1.1 kg/h. Stage ooff Development::
Innovative Aspect and Main Advantages::
Electron beam technology differs from the currently available
methods of arc and laser evaporation of carbon by availability
of many parameters for fine adjustment of the main stages of
the evaporation process, vapour flow formation and its con(cid:2)
densation, namely:
1. Area, average values of evaporation rate and temperature
of atoms (molecules) evaporated from the tungsten “hot
poolâ€.
2. Temperature, composition and molecular structure of the
vapour flow after reflection from the heated surfaces, vapour
flow ionization, bleeding gases and using additives of inorgan(cid:2)
ic and organic substances, including catalysts of the growth of
macromolecular structures of the type of nanotubes and
fullerenes.
Temperature of the condensation surface of an oriented
Technology and equipment have been patented, experimental
facilities are available, and a demonstration can be done. Contact Details::
Іnternational Center for Electron Beam Technologies of
E.O.Paton Electric Welding Institute of NASU
68, Gorky str., Kiev(cid:2)150, 03150, Ukraine
Kurapov Yuriy ;Yakovchuk Konstantin
Tel. +38 044 289(cid:2)2176
Fax +38 044 287(cid:2)3166
E(cid:2)mail: yakovchuk@paton(cid:2)icebt.kiev.ua
http://www.paton(cid:2)icebt.kiev.ua
INNOVATIVETECHNOLOGY OPPORTUNITIES FROM THE STCU
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