IDEA #6J9CY6 Electron Beam Technology And Equipment For Producing Carboon-Based Materials With An Amorphous, Nano- And Micro-Sized Structure

ELECTRON BEAM TECHNOLOGY AND EQUIPMENT FOR PRODUCING CARBON(cid:2)(cid:2)BASED MATERIALS WITH AANN AMORPHOUS,, NANO(cid:2)(cid:2)AND MICRO(cid:2)(cid:2)SIZED STRUCTURE APPENDIX OOFF INNOVATIVETECHNOLOGIES • RESEARCHOONN NANOSTRUCTURESDescription Technology is based on the method of electron beam evapora(cid:2) tion of carbon (graphite) using a liquid pool of tungsten and subsequent condensation of the vapour flow, which was sug(cid:2) gested by us and patented in Ukraine and the USA (US Patent #5296274, cl. B05D 1/00 Movchan B.A. and others. “Method of producing carbon(cid:2)containing materials by electron beam vacuum evaporation of graphite and subsequent condensa(cid:2) tion”). Evaporation is performed as follows: a plano(cid:2)cylindrical tungsten tablet 5 – 10 mm high is placed on the end face of a cylindrical graphite block of 50 – 100 mm diameter and spec(cid:2) ified length. The tablet is melted by the electron beam and forms a “hot pool”. A continuous transport process of carbon dissolution in the liquid pool volume, subsequent evaporation from the pool surface and formation of an intensive vapour flow of carbon atoms (clusters) is established. Tungsten prac(cid:2) tically does not evaporate. Located near the above(cid:2)mentioned carbon evaporation source is the second independent traditional source of elec(cid:2) tron beam evaporation of metallic and non(cid:2)metallic materials, which are added to the main vapour flow of carbon by evapo(cid:2) ration, if required (The third evaporation source can also be used). This method has been recently improved by applying the tech(cid:2) nique of reflection of the vapour flow of carbon (or carbon plus additives) from surfaces (mirrors) heated up to high tempera(cid:2) tures (1000 – 1800°C), to form in space vapour flows of a specified orientation and more uniform in terms of composi(cid:2) tion, structure and energy of the particles. This improvement is required at subsequent deposition of the vapor flow and “engi(cid:2) neering” of the specified coating structure. Vapour flow ionization and bleeding gases into the vacuum chamber can be used as additional technological parameters for controlling the deposition process and condensate struc(cid:2) ture. Temperature of the deposition surface is one of the main tech(cid:2) nological parameters, controlling the condensate structure. vapour flow in the range from room temperature to 1000(cid:2) 1200°C and respective structures 3. from amorphous to nano(cid:2) and micro(cid:2)sized. Possibility of producing macromolecular (fullerenes, nan(cid:2) otubes) and diamondlike structures, carbides and composite materials (coatings) on their base is shown. A pilot production electron beam unit of up to 250 kW power adapted to the above technology variants is available. Areas ooff Application:: Electronics and optoelectronics, medicine, chemical technolo(cid:2) gy, instrument and mechanical engineering. a) b) Pic.1 Examples of special structures of carbon con(cid:2) densates: nanotubes (a) and spheres (b). Rate of evaporation of a graphite block of 70 mm diameter is equal to 1.0 – 1.1 kg/h. Stage ooff Development:: Innovative Aspect and Main Advantages:: Electron beam technology differs from the currently available methods of arc and laser evaporation of carbon by availability of many parameters for fine adjustment of the main stages of the evaporation process, vapour flow formation and its con(cid:2) densation, namely: 1. Area, average values of evaporation rate and temperature of atoms (molecules) evaporated from the tungsten “hot pool”. 2. Temperature, composition and molecular structure of the vapour flow after reflection from the heated surfaces, vapour flow ionization, bleeding gases and using additives of inorgan(cid:2) ic and organic substances, including catalysts of the growth of macromolecular structures of the type of nanotubes and fullerenes. Temperature of the condensation surface of an oriented Technology and equipment have been patented, experimental facilities are available, and a demonstration can be done. Contact Details:: Іnternational Center for Electron Beam Technologies of E.O.Paton Electric Welding Institute of NASU 68, Gorky str., Kiev(cid:2)150, 03150, Ukraine Kurapov Yuriy ;Yakovchuk Konstantin Tel. +38 044 289(cid:2)2176 Fax +38 044 287(cid:2)3166 E(cid:2)mail: yakovchuk@paton(cid:2)icebt.kiev.ua http://www.paton(cid:2)icebt.kiev.ua INNOVATIVETECHNOLOGY OPPORTUNITIES FROM THE STCU 187